An Oxidation Behavior of the Amorphous Titanium Chromium Nitride Thin Films

Main Article Content

Adisorn Buranawong
Nirun Witit-anun

Abstract

Titanium chromium nitride (TiCrN) thin films were deposited on Si by reactive DC magnetron sputtering technique from a mosaic target. The oxidation behavior of TiCrN films was investigated by annealing in ambient air at 500-900oC for 1 h. The as-deposited film was characterized by X-ray diffraction techniques (XRD), energy-dispersive X-ray spectroscopy (EDS), and field-emission scanning electron microscopy (FE-SEM). The oxidation rate and oxidation activation energy were calculated from Wagner’s equation and Arrhenius’s equation, respectively. The results showed that the as-deposited thin film had an amorphous TiCrN structure. After annealing up to 900oC, the films still showed the amorphous structure. The EDS analysis found that the as-deposited films were composed of titanium, chromium, nitrogen, and oxygen in a different ratio. In addition, the oxygen content in the film increased with annealed temperature. The cross-sectional analysis from the FE-SEM technique showed a very thin oxide layer on surface of the as-deposited TiCrN film at 700oC and the oxide layer thickness was increased with the annealed temperature. Moreover, the as-deposited films were fully oxidized at 900oC. The results revealed that the as-deposited films can resist the oxidation up to 600oC, and the oxidation rate of films varied with annealing temperature. The oxidation activation energy was 134.90 kJ/mol.

Article Details

How to Cite
Buranawong, A., & Witit-anun, N. . (2023). An Oxidation Behavior of the Amorphous Titanium Chromium Nitride Thin Films. Vocational Education Innovation and Research Journal, 7(2), 106–115. retrieved from https://so06.tci-thaijo.org/index.php/ve-irj/article/view/266945
Section
Research Articles

References

Witit-anun, N. and Buranawong, A. “Effect of Substrate-target Distance on the Structure of TiCrN Films Deposited from Mosaic Target by Reactive DC Magnetron Sputtering,” Key Engineering Materials. 798: 163-168, 2019.

Krzanowski, J. and Foley, D. “The Effect of Cr Content on the Oxidation Behavior of Ti-Cr-N Films,” Coatings. 4(2): 308-319, 2014.

Danek, M., Fernandes, F., Cavaleiro, A. and Polcar, T. “Influence of Cr Additions on the Structure and Oxidation Resistance of Multilayered TiCrAlN Films,” Surface and Coatings Technology. 313: 158-167, 2017.

Paksunchai, C., Denchitcharoen, S., Chaiyakun, S. and Limsuwan, P. “Growth and Characterization of Nanostructured TiCrN Films Prepared by DC Magnetron Co-Sputtering,” Journal of Nanomaterials, 2014: 1-9, 2014.

Samapisut, S., Tipparach, U., Heness, G. and McCredie, G. “Effect of Magnetron Discharge Power and N2 Flow Rate for Preparation of TiCrN Thin Film,” Procedia Engineering. 32: 1135-1138, 2012.

Golosoc, D.A., Melnikov, S.N. and Dostanko, A.P. “Calculation of the Elemental Composition of Thin Films Deposited by Magnetron Sputtering of Mosaic Targets,” Surface Engineering and Applied Electrochemistry. 48: 52-59, 2012.

Forsén, R., Johansson, M.P., Odén, M. and Ghafoor, N. “Effect of Ti alloying of AlCrN Coatings on Thermal Stability and Oxidation Resistance,” Thin Solid Films. 534: 394-402, 2013.

Witit-anun, N. and Teekhaboot, A., “Effect of Ti Sputtering Current on Structure of TiCrN Thin Films Prepared by Reactive DC Magnetron Co-Sputtering,” Key Engineering Materials. 675-676: 181-184, 2016

Buranawong, A. and Witit-anun, N. “Oxidation Behavior of Nanostructure Sputtered Titanium Nitride Thin Films,” Current Applied Science and Technology, 22(6): 1-11, 2022.

Komatsu, I., Aoki, H., Ebisawa, M., Kuroda, A., Kurroda, K., and Maeda, S. “Color change mechanism of niobium oxide thin film with incidental light angel and applied voltage”. Thin Solid Films, 603: 180-186, 2016.

Aliaj, F., Syla, N., Oettel, H. and Dilo, T. “Thermal Treatment in Air of Direct Current (DC) Magnetron Sputtered TiN Coatings”. Scientific Research and Essays. 11: 230-238, 2016.

Chen, H.Y. and Lu, F.H. “Oxidation Behavior of Chromium Nitride Films”. Thin Solid Films, 515: 2179-2184, 2006.

Youxing, H., Kewei, G., Huisheng, Yang., Xiaolu, P. and Volinsky, A.A. “Nitrogen Effects on Structure, Mechanical and Thermal Fracture Properties of CrN Films”. Ceramics International, 515: 30729-30740, 2021.

Lee, D.B., Kim, M.H., Lee, Y.C., & Kwon, S.C. “High Temperature Oxidation of TiCrN Coatings Deposited on a Steel Substrate by Ion Plating”. Surface and Coatings Technology, 141: 232-239, 2001.

Alaksanasuwan, S., Buranawong, A. & Witit-anun, N. “Structural and Oxidation Behavior of Nanocomposite TiCrN Thin Films”. Suan Sunandha Science and Technology Journal, 9: 53-62, 2022.

Otani, Y. and Hofmann, S. “High Temperature Oxidation Behavior of (Ti1-xCrx)N Coatings”. Thin Solid Films. 287: 188-192, 1996.

Panjan, P., Navinsek, B., Cvelbar, A., Zalar, A. and Milosev, I. “Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN Multilayer Hard Coatings Reactively Sputtered at Low Temperature”, Thin Solid Films. 281-282: 298-301, 1996.